Nano Ag Ink Patterning
Mixed Fine Wiring Line Width/Direction
- Metal Mesh Patterning
- Printing Area Ratio = 1:50 or more
- Connection Distortion Control of Wiring in Contact
- Pattern shape / Orthogonality at Wiring Intersection
Line Pattern
- Bent Portion
- L/S=5μm
- Parallel Patterning
- Corner Resolution / Patterning uniformization
- Concentric Pentagon
- L=2.5μm/S=1.5μm
- Migration Evaluation Circuit
- L/S=3μm
Test Circuit
- Circuit Patterning
- Mixed Print Wiring Line Width / Spacing
(Minimum line width:L/S=7/5μm)
- No Directionality for Printing