Nano Ag Ink Patterning

Mixed Fine Wiring Line Width/Direction

Metal Mesh Patterning
Printing Area Ratio = 1:50 or more
Connection Distortion Control of Wiring in Contact
Pattern shape / Orthogonality at Wiring Intersection

Line Pattern

Bent Portion
L/S=5μm
Parallel Patterning
Corner Resolution / Patterning uniformization
Concentric Pentagon
L=2.5μm/S=1.5μm
Migration Evaluation Circuit
L/S=3μm

Test Circuit

Circuit Patterning
Mixed Print Wiring Line Width / Spacing
(Minimum line width:L/S=7/5μm)
No Directionality for Printing