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Reflective spectroscopic film thickness meter (Interfererometry)

Reflectance spectroscopic film thickness monitors that uses optical interferometry.
These are easy to handle and can measure the thickness of transparent films from 1 nm to several hundred microns.

Wafer mapping film thickness measurement unit SK-FTM-Map series

Wafer mapping film thickness measurement unit enables automatic mapping of the entire surface of 300mm wafer.
It is equipped with a highly accurate notch (or orientation flat) detection function and is used in combination with a compact film thickness monitor.
It can be installed at the load port of semiconductor manufacturing equipment to control the film thickness on the manufacturing equipment while maintaining cleanliness.
It can also be used to measure inside arbitrary patterns other than wafers.


Infrared spectroscopic transmission thickness monitor (Photo absorption method)